Santa Clara University

 

Center for Nanostructures
Bannan Engineering, 1st floor, EC100

Hours: 8:30 a.m. - 5:30 p.m.
Phone: (408) 551-1712
     Fax: (408) 551-3030

Click here for a map

CNS

Hitachi S-4800 Field Emission SEM

sem01_1

Specifications:

Resolution Accelerating voltage 15 kV, working distance 4 mm - 1.0 nm
Accelerating voltage 1 kV, working distance 1.5 mm - 2.0 nm
Magnification Magnification: High magnification mode - 100X to 800,000X
Low magnification mode - 30X to 2,000X
Electron Optics Electron Gun - Cold cathode field emission type
Extracting voltage - 0 to 6.5 kV
Accelerating voltage - 0.5 to 30 kV
Lens - 3-stage electromagnetic lens, reduction type
Objective lens aperture - movable aperture
Astigmatism correction coil - electromagnetic type
Scanning coil - 2-stage electromagnetic-deflection type
Specimen Stage Tilt -5 degrees to +70 degrees
Rotation 360 degrees (continuous)
Specimen size - Max. 150 mm diameter (airlock specimen exchange)

Scanning Transmission Electron Microscope (STEM)

Specifications:
Resolution 1.5 nm (with accelerating voltage 30 kV, WD 8 mm and magnification 150,000X)
Detector Scintillator + photomultiplier system
Specimen thin-sectioned specimen mounted on a 3 mm diameter specimen grid
Mode Bright field image

Zyvex IC Nanoprober System

Specifications:
Sample Size 12 mm diameter
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